文献詳細
文献概要
特集 水頭症—脳脊髄液動態への理解と治療に迫る Ⅲ水頭症の治療
シャントデバイスの原理と選択のエビデンス
著者: 喜多大輔1
所属機関: 1公立能登総合病院脳神経外科
ページ範囲:P.331 - P.347
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・差圧バルブはバルブ両端の圧較差によって開閉する.
・シャント設置後の頭蓋内圧は頭蓋外環境に連動して変化する.
・抗サイフォンデバイスとして流量調整機構と重力バルブ機構がある.
・抗菌カテーテルには使用を推奨するエビデンスがある.
・常時モニタリング可能な次世代シャントが開発中である.
・差圧バルブはバルブ両端の圧較差によって開閉する.
・シャント設置後の頭蓋内圧は頭蓋外環境に連動して変化する.
・抗サイフォンデバイスとして流量調整機構と重力バルブ機構がある.
・抗菌カテーテルには使用を推奨するエビデンスがある.
・常時モニタリング可能な次世代シャントが開発中である.
参考文献
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